High Quality, Lowest Cost Sputter & PLD Targets, Evaporation & Single Crystal materials and Ceramics, Custom Thin films

Collection: Sputtering & PLD Targets

High purity metal, alloy, mixture, compound sputtering  and pulsed laser deposition (PLD) targets in standard round shapes and custom configurations. Contact us for your special needs,
54 products
  • Indium Oxide, In2O3 - Sputtering Target - 99.99% purity
    Indium Oxide, In2O3 - Sputtering Target - 99.99% purity
  • Indium Tin Oxide, ITO - Sputtering Target - 99.99% purity
    Indium Tin Oxide, ITO - Sputtering Target - 99.99% purity
  • InGaZnO4 - Bonded Target, - Sputtering Target - 99.99% purity
    InGaZnO4 - Bonded Target, - Sputtering Target - 99.99% purity
  • KNN- Pottasium Sodium Niobate- Sputtering Target
    KNN- Pottasium Sodium Niobate- Sputtering Target
  • KNN-Li - Potassium Sodium Niobate Li doped - Sputtering Target
    KNN-Li - Potassium Sodium Niobate Li doped - Sputtering Target
  • Lithium Niobate, LiNbO3 - Sputtering Target - 99.99% purity
    Lithium Niobate, LiNbO3 - Sputtering Target - 99.99% purity
  • LMO - LaMnO3 Sputtering Target - 99.9% purity
    LMO - LaMnO3 Sputtering Target - 99.9% purity
  • LSMO - La0.7Sr0.3MnO3 Sputtering Target - 99.9% purity
    LSMO - La0.7Sr0.3MnO3 Sputtering Target - 99.9% purity
  • Magnesium Fluoride, MgF2 - Sputtering Target - 99.99% purity
    Magnesium Fluoride, MgF2 - Sputtering Target - 99.99% purity
  • Magnesium Oxide, MgO - Sputtering Target - 99.99% purity
    Magnesium Oxide, MgO - Sputtering Target - 99.99% purity
  • Molybdenum silicide-Sputter Target - 99.5%
    Molybdenum  silicide-Sputter Target - 99.5%
  • Molybdenum di sulfide, MoS2 - Sputtering Target - 99.5% purity
    Molybdenum di sulfide, MoS2 - Sputtering Target - 99.5% purity
  • Molybdenum trioxide, MoO3 - Sputtering Target - 99.99% purity
    Molybdenum trioxide, MoO3 - Sputtering Target - 99.99% purity
  • Nickel Oxide, NiO - Sputtering Target - 99.99% purity
    Nickel Oxide, NiO - Sputtering Target - 99.99% purity
  • Nickel Sulfide, Ni3S2- Sputtering Target - 99.5% purity
    Nickel Sulfide,  Ni3S2- Sputtering Target - 99.5% purity
  • Niobium Oxide , Nb2O5 - Sputtering Target - 99.99% purity
    Niobium Oxide , Nb2O5 - Sputtering Target - 99.99% purity
  • Niobium Selenide, NbSe - Sputtering Target - 99.9% purity
    Niobium Selenide, NbSe - Sputtering Target - 99.9% purity
  • PMN-PT - Sputtering Target - 99.9% purity
    PMN-PT - Sputtering Target - 99.9% purity
  • PZT - Sputtering Target - 99.99% purity
    PZT - Sputtering Target - 99.99% purity
  • Silicon dioxide, SiO2 - Sputtering Target - 99.99% purity
    Silicon dioxide, SiO2 - Sputtering Target - 99.99% purity