High Quality, Lowest Cost Sputter & PLD Targets, Evaporation & Single Crystal materials , Ceramic machining, Sputtering Systems & Thermal evaporators for SEM Sample Preparation and thin film research

LSMO - La0.7Sr0.3MnO3 Sputtering Target - 99.9% purity

LSMO - La0.7Sr0.3MnO3 Sputtering Target - 99.9% purity

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High purity(99.9%), low cost standard round LSMO, La0.7Sr0.3MnO3  Sputter Targets 

  * ~85% relative density  * Low gas content    * Dense and homogeneous 

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Highly sensitive to moisture. Store under UHV or inert gas ambient.