High Quality, Lowest Cost Sputter & PLD Targets, Evaporation & Single Crystal materials , Ceramic machining, Sputtering Systems & Thermal evaporators for SEM Sample Preparation and thin film research

Collection: Sputtering & PLD Targets

High purity metal, alloy, mixture, compound sputteringĀ  and pulsed laser deposition (PLD) targets in standard round shapes and custom configurations. Contact us for your special needs,
52 products
  • Strontium Ruthenate, SrRuO3 - Sputtering Target
    Strontium Ruthenate, SrRuO3 - Sputtering Target
  • Strontium Ruthenium Titanate - Sputtering Target - 99.9% purity
    Strontium Ruthenium Titanate - Sputtering Target - 99.9% purity
  • Tantalum pentoxide, Ta2O5 - Sputtering Target - 99.99% purity
    Tantalum pentoxide, Ta2O5 - Sputtering Target - 99.99% purity
  • Tin Oxide- Sputtering Target
    Tin Oxide- Sputtering Target
  • Titanium Oxide- black, TiOx- Sputtering Target - 99.99% purity
    Titanium Oxide- black, TiOx- Sputtering Target - 99.99% purity
  • Titanium Selenide, TiSe2- Sputtering Target
    Titanium Selenide, TiSe2- Sputtering Target
  • Tungsten oxide WO3- Sputtering Target
    Tungsten oxide  WO3- Sputtering Target
  • Zinc Oxide - ZnO - Sputtering Target 99.999% & 99.99% purity
    Zinc Oxide - ZnO - Sputtering Target 99.999% & 99.99% purity
  • Zinc Oxide, ZnO Sputtering Target MAK4 configuration -99.999%
    Zinc Oxide, ZnO Sputtering Target MAK4 configuration -99.999%
  • Zinc Sulfide, ZnS - Sputtering Target - 99.99% purity
    Zinc Sulfide, ZnS - Sputtering Target - 99.99% purity
  • Zirconia- Yttria stabilized, ZrO2/Y2O3 - Sputtering Target - 99.9% purity
    Zirconia- Yttria stabilized, ZrO2/Y2O3 - Sputtering Target - 99.9% purity
  • ZnO/MgO (80:20 wt%) - Sputtering Target - 99.99% purity
    ZnO/MgO (80:20 wt%) - Sputtering Target - 99.99% purity