High Quality, Lowest Cost Sputter & PLD Targets, Evaporation & Single Crystal materials , Ceramic machining, Sputtering Systems & Thermal evaporators for SEM Sample Preparation and thin film research

Sputtering & PLD Targets

High purity metal, alloy, mixture, compound sputteringĀ  and pulsed laser deposition (PLD) targets in standard round shapes and custom configurations. Contact us for your special needs,
90 products
  • Al-Cu 99/1 wt% Alloy Sputtering Target
  • Al-Sc 87.5/12.5 wt% Alloy Sputtering Target
  • Al-Sn-Cu 79:20:1 wt% Alloy Sputtering Target
  • Aluminum doped Zinc Oxide-AZO- Sputtering Target
  • Aluminum nitride, AlN - Sputtering Target
  • Aluminum Oxide, Al2O3 - Sputtering Target - 99.99% purity
  • Aluminum, Al - Sputtering Target
  • Antimony, Sb - Sputtering Target
  • Barium Titanate, BTO - Sputtering Target
  • Bismuth Selenide , Bi2Se3 - Sputtering Target
  • Bismuth Telluride, Bi2Te3 - Sputtering Target
  • Boron, B - Sputtering Target
  • Cadmium Sulfide, CdS - Sputtering Target
  • Calcium Fluoride, CaF2 - Sputtering Target
  • Calcium Manganate, CaMnO3 - Sputtering Target
  • Calcium Ruthenate, CaRuO3 - Sputtering Target
  • Calcium Ruthenium-Titanate, Ca(Ru0.5Ti0.5)O3 - Sputtering Target
  • Calcium Titanate, CaTiO3 - Sputtering Target
  • Carbon, C - Sputtering Target
  • Cerium Oxide, CeO - Sputtering Target - 99.99% purity