High Quality, Lowest Cost Sputter & PLD Targets, Evaporation & Single Crystal materials , Ceramic machining, Sputtering Systems & Thermal evaporators for SEM Sample Preparation and thin film research

Sputtering & PLD Targets

High purity metal, alloy, mixture, compound sputteringĀ  and pulsed laser deposition (PLD) targets in standard round shapes and custom configurations. Contact us for your special needs,
90 products
  • Chromium Oxide, Cr2O3 - Sputtering Target - 99.99% purity
  • Chromium, Cr - Sputtering Target
  • Chromium-Silicon, CrSi2 - Sputtering Target
  • CIGS - Sputtering Target - for solar cells
  • Cobalt with Iron, Boron & Silicon mixture- Sputtering Targets
  • Cobalt, Co - Sputtering Target
  • Copper Oxide, Cu2O - Sputtering Target
  • Copper, Cu - Sputtering Target
  • CuGa - Sputtering Target - 99.99% purity
  • CZT- Cobalt Zirconium Tantalum sputtering targets
  • CZTS & CZTS-Se- Copper-Zinc-Tin-Sulfur-Selenium Sputtering Targets
  • Ga-ZnO - Sputtering Target - 99.99% purity
  • Ga2TeO3 - Sputtering Target - 99.99% purity
  • Germanium, Ge - Sputtering Target - 99.999% purity
  • Indium Oxide, In2O3 - Sputtering Target - 99.99% purity
  • Indium Tin Oxide, ITO - Sputtering Target - 99.99% purity
  • Indium, In - Sputtering Target - 99.999% & 99.99% purity
  • InGaZnO4 - Bonded Target, - Sputtering Target - 99.99% purity
  • Iron Silicon Boron , FeSiB - Sputtering Target - 99.9% purity
  • Iron, Fe - Sputtering Target