High Quality, Lowest Cost Sputter & PLD Targets, Evaporation & Single Crystal materials , Ceramic machining, Sputtering Systems & Thermal evaporators for SEM Sample Preparation and thin film research

Al-Sn-Cu   79:20:1 wt% Alloy Sputtering Target

Al-Sn-Cu 79:20:1 wt% Alloy Sputtering Target

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High purity, low cost standard round Al-Sn-Cu (79/20/1 wt%) Sputter Targets  99.99% purity

 * ~90% density  * Low gas content    * Dense and homogeneous * Small, uniform grains <100um

Contact us: Request  for larger and Custom Sizes &  Target Bonding services