High Quality, Lowest Cost Sputter & PLD Targets, Evaporation & Single Crystal materials , Ceramic machining, Sputtering Systems & Thermal evaporators for SEM Sample Preparation and thin film research

Sputtering & PLD Targets

High purity metal, alloy, mixture, compound sputteringĀ  and pulsed laser deposition (PLD) targets in standard round shapes and custom configurations. Contact us for your special needs,
14 products
  • Al-Cu 99/1 wt% Alloy Sputtering Target
  • Al-Sc 87.5/12.5 wt% Alloy Sputtering Target
  • Al-Sn-Cu 79:20:1 wt% Alloy Sputtering Target
  • Chromium-Silicon, CrSi2 - Sputtering Target
  • Cobalt with Iron, Boron & Silicon mixture- Sputtering Targets
  • CuGa - Sputtering Target - 99.99% purity
  • CZT- Cobalt Zirconium Tantalum sputtering targets
  • Iron Silicon Boron , FeSiB - Sputtering Target - 99.9% purity
  • Manganese-Germanium, Mn3Ge - Sputtering Target - 99.9% purity
  • Manganese-Tin, Mn3Sn- Sputtering Target - 99.9% purity
  • Nickel Vanadium(93:7 wt%), Ni-V - Sputtering Target - 99.95% purity
  • Permalloy, Ni:Fe - Sputtering Target - 99.95% purity
  • Titanium-Tungsten, TiW- Sputtering Target - 99.99% purity
  • Zinc Aluminum (98:2 wt%) ZnAl - Sputtering Target - 99.99% purity