High Quality, Lowest Cost Sputter & PLD Targets, Evaporation & Single Crystal materials , Ceramic machining, Sputtering Systems & Thermal evaporators for SEM Sample Preparation and thin film research

Sputtering & PLD Targets

High purity metal, alloy, mixture, compound sputtering  and pulsed laser deposition (PLD) targets in standard round shapes and custom configurations. Contact us for your special needs,
90 products
  • Tungsten, W - Sputtering Target - 99.95% purity
  • Vanadium, V - Sputtering Target - 99.9% purity
  • Zinc Aluminum (98:2 wt%) ZnAl - Sputtering Target - 99.99% purity
  • Zinc Oxide - ZnO - Sputtering Target 99.999% & 99.99% purity
  • Zinc Oxide, ZnO Sputtering Target MAK4 configuration -99.999%
  • Zinc Sulfide, ZnS - Sputtering Target - 99.99% purity
  • Zinc, Zn - Sputtering Target - 99.99% purity
  • Zirconia- Yttria stabilized, ZrO2/Y2O3 - Sputtering Target - 99.9% purity
  • Zirconium, Zr - Sputtering Target
  • ZnO/MgO (80:20 wt%) - Sputtering Target - 99.99% purity