High Quality, Lowest Cost Sputter & PLD Targets, Evaporation & Single Crystal materials , Ceramic machining, Sputtering Systems & Thermal evaporators for SEM Sample Preparation and thin film research

Sputtering & PLD Targets

High purity metal, alloy, mixture, compound sputteringĀ  and pulsed laser deposition (PLD) targets in standard round shapes and custom configurations. Contact us for your special needs,
90 products
  • Permalloy, Ni:Fe - Sputtering Target - 99.95% purity
  • PMN-PT - Sputtering Target - 99.9% purity
  • PZT - Sputtering Target - 99.99% purity
  • Ruthenium, Ru - Sputtering Target -99.95%
  • Silicon dioxide, SiO2 - Sputtering Target - 99.99% purity
  • Silicon monoxide, SiO - Sputtering Target - 99.99% purity
  • Silicon Nitride, Si3N4 - Sputtering Target
  • Silicon, Si - Sputtering Target - 99.999% purity
  • Silver, Ag - Sputtering Target - 99.999% & 99.99% purity
  • Strontium Ruthenate, SrRuO3 - Sputtering Target
  • Strontium Ruthenium Titanate - Sputtering Target - 99.9% purity
  • Tantalum pentoxide, Ta2O5 - Sputtering Target - 99.99% purity
  • Tantalum, Ta - Sputtering Target
  • Tin - Sputtering Target - 99.99% purity
  • Tin Oxide- Sputtering Target
  • Titanium Oxide- black, TiOx- Sputtering Target - 99.99% purity
  • Titanium Selenide, TiSe2- Sputtering Target
  • Titanium, Ti - Sputtering Target - 99.99% & 99.995% purity
  • Titanium-Tungsten, TiW- Sputtering Target - 99.99% purity
  • Tungsten oxide WO3- Sputtering Target