High Quality, Lowest Cost Sputter & PLD Targets, Evaporation & Single Crystal materials , Ceramic machining, Sputtering Systems & Thermal evaporators for SEM Sample Preparation and thin film research

Sputtering & PLD Targets

High purity metal, alloy, mixture, compound sputteringĀ  and pulsed laser deposition (PLD) targets in standard round shapes and custom configurations. Contact us for your special needs,
35 products
  • Nickel Vanadium(93:7 wt%), Ni-V - Sputtering Target - 99.95% purity
  • Nickel, Ni - Sputtering Target - 99.99%, 99.999% purity
  • Niobium, Nb - Sputtering Target - 99.95% purity
  • Permalloy, Ni:Fe - Sputtering Target - 99.95% purity
  • Ruthenium, Ru - Sputtering Target -99.95%
  • Silver, Ag - Sputtering Target - 99.99% purity
  • Tantalum, Ta - Sputtering Target
  • Tin - Sputtering Target - 99.99% purity
  • Titanium, Ti - Sputtering Target - 99.99% & 99.995% purity
  • Titanium-Tungsten, TiW- Sputtering Target - 99.99% purity
  • Tungsten, W - Sputtering Target - 99.95% purity
  • Vanadium, V - Sputtering Target - 99.9% purity
  • Zinc Aluminum (98:2 wt%) ZnAl - Sputtering Target - 99.99% purity
  • Zinc, Zn - Sputtering Target - 99.99% purity
  • Zirconium, Zr - Sputtering Target