High Quality, Lowest Cost Sputter & PLD Targets, Evaporation & Single Crystal materials , Ceramic machining, Sputtering Systems & Thermal evaporators for SEM Sample Preparation and thin film research

Al-Sc  87.5/12.5 wt% Alloy Sputtering Target

Al-Sc 87.5/12.5 wt% Alloy Sputtering Target

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High purity, low cost standard round Al-Sc (87.5/12.5 wt%) Sputter Targets  99.99% purity

 *  For high performace Piezoelectric material- CMOS compatible (as Al-Sc nitride)

* ~100% density 

 * Low gas content    * Dense and homogeneous * Small, uniform grains <100um

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