High Quality, Lowest Cost Sputter & PLD Targets, Evaporation & Single Crystal materials , Ceramic machining, Sputtering Systems & Thermal evaporators for SEM Sample Preparation and thin film research

Pure metals

Sputtering targets of various pure metals available in planar and tubularĀ  forms.

Purity from 99.5% to 99.999%

54 products
  • Al-Sn-Cu 79:20:1 wt% Alloy Sputtering Target
  • Al-Cu 99/1 wt% Alloy Sputtering Target
  • Tantalum, Ta - Sputtering Target
  • Ruthenium, Ru - Sputtering Target -99.95%
  • Manganese-Tin, Mn3Sn- Sputtering Target - 99.9% purity
  • Iron Silicon Boron , FeSiB - Sputtering Target - 99.9% purity
  • Antimony, Sb - Sputtering Target
  • Molybdenum di sulfide, MoS2 - Sputtering Target - 99.5% purity
  • Manganese-Germanium, Mn3Ge - Sputtering Target - 99.9% purity
  • Zinc Aluminum (98:2 wt%) ZnAl - Sputtering Target - 99.99% purity
  • Tin - Sputtering Target - 99.99% purity
  • Indium, In - Sputtering Target - 99.999% & 99.99% purity
  • CuGa - Sputtering Target - 99.99% purity
  • Permalloy, Ni:Fe - Sputtering Target - 99.95% purity