High Quality, Lowest Cost Sputter & PLD Targets, Evaporation & Single Crystal materials , Ceramic machining, Sputtering Systems & Thermal evaporators for SEM Sample Preparation and thin film research

Compound sputtering & PLD targets

Sputtering and Pulsed Laser Deposition  targets of various compound materials  available. Please contact us  for your custom requirements

sales@himet-materials.com

52 products
  • Indium Tin Oxide, ITO - Sputtering Target - 99.99% purity
  • InGaZnO4 - Bonded Target, - Sputtering Target - 99.99% purity
  • KNN- Pottasium Sodium Niobate- Sputtering Target
  • KNN-Li - Potassium Sodium Niobate Li doped - Sputtering Target
  • Lithium Niobate, LiNbO3 - Sputtering Target - 99.99% purity
  • LSMO - La0.7Sr0.3MnO3 Sputtering Target - 99.9% purity
  • Magnesium Fluoride, MgF2 - Sputtering Target - 99.99% purity
  • Magnesium Oxide, MgO - Sputtering Target - 99.99% purity
  • Molybdenum silicide-Sputter Target - 99.5%
  • Molybdenum di sulfide, MoS2 - Sputtering Target - 99.5% purity
  • Molybdenum trioxide, MoO3 - Sputtering Target - 99.99% purity
  • Nickel Oxide, NiO - Sputtering Target - 99.99% purity
  • Nickel Sulfide, Ni3S2- Sputtering Target - 99.5% purity
  • Niobium Oxide , Nb2O5 - Sputtering Target - 99.99% purity
  • Niobium Selenide, NbSe - Sputtering Target - 99.9% purity
  • PMN-PT - Sputtering Target - 99.9% purity
  • PZT - Sputtering Target - 99.99% purity
  • Silicon dioxide, SiO2 - Sputtering Target - 99.99% purity
  • Silicon monoxide, SiO - Sputtering Target - 99.99% purity
  • Silicon Nitride, Si3N4 - Sputtering Target