High Quality, Lowest Cost Sputter & PLD Targets, Evaporation & Single Crystal materials , Ceramic machining, Sputtering Systems & Thermal evaporators for SEM Sample Preparation and thin film research

Aluminum Oxide, Al2O3 - Sputtering Target - 99.99% purity

Aluminum Oxide, Al2O3 - Sputtering Target - 99.99% purity

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High purity(99.99%), low cost standard round Aluminium Oxide, Al2O3 Sputtering Targets 

  * ~90% density  * Low gas content    * Dense and homogeneous 

*Contact Us  - Request  for Custom Sizes & Target Bonding services

 

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