High Quality, Lowest Cost Sputter & PLD Targets, Evaporation & Single Crystal materials , Ceramic machining, Sputtering Systems & Thermal evaporators for SEM Sample Preparation and thin film research

Hafnium Oxide, HfO2 - Sputtering Target - 99.95% purity

Hafnium Oxide, HfO2 - Sputtering Target - 99.95% purity

Regular price
$514.00
Sale price
$514.00
Unit price
per 

This takes 30 days to ship

High purity (99.95%), low cost standard round Hafnium Oxide Sputter Targets 

  * ~100% density  * Low gas content    * Dense and homogeneous 

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