High Quality, Lowest Cost Sputter & PLD Targets, Evaporation & Single Crystal materials , Ceramic machining, Sputtering Systems & Thermal evaporators for SEM Sample Preparation and thin film research

Compound sputtering & PLD targets

Sputtering and Pulsed Laser Deposition  targets of various compound materials  available. Please contact us  for your custom requirements

sales@himet-materials.com

52 products
  • Aluminum doped Zinc Oxide-AZO- Sputtering Target
  • Aluminum nitride, AlN - Sputtering Target
  • Aluminum Oxide, Al2O3 - Sputtering Target - 99.99% purity
  • Barium Titanate, BTO - Sputtering Target
  • Bismuth Selenide , Bi2Se3 - Sputtering Target
  • Bismuth Telluride, Bi2Te3 - Sputtering Target
  • Cadmium Sulfide, CdS - Sputtering Target
  • Calcium Fluoride, CaF2 - Sputtering Target
  • Calcium Manganate, CaMnO3 - Sputtering Target
  • Calcium Ruthenate, CaRuO3 - Sputtering Target
  • Calcium Ruthenium-Titanate, Ca(Ru0.5Ti0.5)O3 - Sputtering Target
  • Calcium Titanate, CaTiO3 - Sputtering Target
  • Cerium Oxide, CeO - Sputtering Target - 99.99% purity
  • Chromium Oxide, Cr2O3 - Sputtering Target - 99.99% purity
  • CIGS - Sputtering Target - for solar cells
  • Copper Oxide, Cu2O - Sputtering Target
  • CZTS & CZTS-Se- Copper-Zinc-Tin-Sulfur-Selenium Sputtering Targets
  • Ga-ZnO - Sputtering Target - 99.99% purity
  • Ga2TeO3 - Sputtering Target - 99.99% purity
  • Indium Oxide, In2O3 - Sputtering Target - 99.99% purity